PPLN Λ = 6.82 µm · 1064 → 532 nm · 2 px/µm

7.8 Peeling the crystal

1995–2014

L1 Narrative

1995-2014 · 9 events

To shrink a lithium niobate waveguide below a micrometer, the crystal itself has to be thin and sit on something with a much lower index. A related method came from silicon. In 1995 Michel Bruel at CEA-LETI in Grenoble implanted hydrogen into silicon, bonded it to another wafer, and heated it until a thin layer split off: Smart Cut [Bruel 1995 rec]. In 1998 a Columbia-led team implanted ions deep into lithium niobate and lifted off 9-micrometer single-crystal films [Levy et al. 1998 rec]. In 2004 ETH Zurich sliced films 680 nm thick onto silicon dioxide and found the electro-optic coefficient intact [Rabiei & Gunter 2004 rec]. Paderborn and Zurich used the name lithium niobate on insulator, LNOI, in a 2012 review, when it already came as 3-inch wafers [Poberaj et al. 2012 rec]. A company in Jinan, NANOLN, founded in 2010, sold the films [NANOLN 2026 rec].

Ion slice — Three steps on one cross-section: implant (depth set by an energy slider, on an illustrative scale through one sourced pair), bond to an oxidized substrate, split and polish. Thin film then and now: 7.5.
Crystal ion slicing, step 1 of 3
~10 µm
3.8 MeV
Damage-layer depth (linear through 3.8 MeV / 10 µm)10.0 µm
Film, Levy et al. 1998 Levy et al. 19989 µm
Film, Rabiei & Günter 2004 Rabiei & Gunter 2004680 nm
3.8 MeV for a damage layer near 10 µm: Levy et al. 1998 rec (patent, not tied to the paper). Other energies: drawn on a linear scale through that pair, not a range calculation.
~10 µm
3.8 MeV
Damage-layer depth
10.0 µm
Scale
sourced pair
Films reported
9 µm (1998), 680 nm (2004)

3.8 MeV and about 10 µm from Levy et al. 1998 (patent, not tied to the paper; other energies on a linear scale through that pair, not a range calculation); films: Levy et al. 1998, Rabiei & Gunter 2004.

A lithium niobate wafer.
A lithium niobate wafer. Smithy71, CC0, file page

L2 Numbers and mechanisms

Peeling the crystal

Ion slicing. Levy et al.: “Deep-ion implantation is used to create a buried sacrificial layer in single-crystal c-cut poled wafers of LiNbO3”; 9 µm films separated and bonded to Si and GaAs [Levy et al. 1998 rec]. The same group's patent gives 3.8 MeV for a damage layer near 10 µm depth and dilute HF etching, without tying them to the paper [Levy et al. 1998 rec]. Rabiei and Gunter: 680 nm films on SiO2 by ion slicing and wafer bonding, crystalline and optical quality comparable to bulk, r33 = 31 pm/V at 633 nm [Rabiei & Gunter 2004 rec]. CEA-LETI transferred LiNbO3 layers by Smart Cut for RF acoustic resonators in 2008-2010 [Pijolat et al. 2008 rec; Moulet et al. 2008 rec; Pijolat et al. 2009 rec; Deguet et al. 2010 rec].

First devices. EO-tunable microrings in a bonded film [Guarino et al. 2007 rec]. Photonic wires by Ar milling down to 1 x 0.73 µm2; 9.9 dB/cm (qTM) and 12.9 dB/cm (qTE) at 1.55 µm [Hu et al. 2009 rec]. LNOI review: sub-micrometer films by ion slicing, two bonding techniques, 3-inch wafers, PP-LNOI SHG, microrings, photonic crystals [Poberaj et al. 2012 rec]. Harvard microdisks: Q about 105, on-chip SHG 0.109 /W [Wang et al. 2014 rec].

Before thin-film wafers. Ridge waveguides were etched into epitaxial Zn-substituted LN by ion-beam enhanced etching: near-vertical sidewalls, 0.9 dB/cm at 1064 nm [Hartung et al. 2008 rec].

Loss, 2009 to 2017 (derived): 9.9 dB/cm [Hu et al. 2009 rec] to 2.7 dB/m = 0.027 dB/cm [Zhang et al. 2017 rec], a factor of about 370.

L3 Sources and status

15 sources cited on this page
ClaimSourceStatus
Smart Cut 1995 (silicon)Bruel 1995rec
CIS of LN 1998, 9 µm filmsLevy et al. 1998 abstractrec
He ions, 3.8 MeVLevy et al. 1998 (not tied to paper)P
680 nm films, r33 31 pm/VRabiei & Gunter 2004 abstractrec
“LNOI”, 3-inch wafers by 2012Poberaj et al. 2012 abstractrec
NANOLN founded 2010company pagerec
NANOLN “world-first 3-inch film” 2015company claim via news (S); conflicts with Poberaj et al. 2012S, disputed (D8)

References

  1. Bruel, Electronics Letters 31 1201-1202 (1995). Silicon on insulator material technology. Issued 1995-07-06. doi:10.1049/el:19950805
  2. Levy et al., Applied Physics Letters 73 2293-2295 (1998). Fabrication of single-crystal lithium niobate films by crystal ion slicing. Issued 1998-10-19. doi:10.1063/1.121801
  3. Rabiei & Gunter, Applied Physics Letters 85 4603-4605 (2004). Optical and electro-optical properties of submicrometer lithium niobate slab waveguides prepared by crystal ion slicing and wafer bonding. Issued 2004-11-15. doi:10.1063/1.1819527
  4. Poberaj et al., Laser & Photonics Reviews 6 488-503 (2012). Lithium niobate on insulator (LNOI) for micro‐photonic devices. Issued 2012-02-15. doi:10.1002/lpor.201100035
  5. About NanoLN (2026). About NanoLN. Issued 2026. www.nanoln.com/ABOUT_NANOLN.html
  6. M. Levy et al. (1998). US 6540827 B1 (crystal ion slicing of single-crystal films). Issued 1998-02-17. patents.google.com/patent/US6540827B1/en
  7. M. Pijolat et al., 2008 IEEE Ultrasonics Symposium 201-204 (2008). Large Qxf product for HBAR using Smart Cut ™ transfer of LiNbO3 thin layers onto LiNbO3 substrate. Issued 2008-11. doi:10.1109/ultsym.2008.0049
  8. J.-S. Moulet et al., 2008 IEEE International Electron Devices Meeting 1-4 (2008). High piezoelectric properties in LiNbO3 transferred layer by the Smart Cut™ technology for ultra wide band BAW filter applications. Issued 2008-12. doi:10.1109/iedm.2008.4796785
  9. M. Pijolat et al., Applied Physics Letters 95 182106 (2009). Large electromechanical coupling factor film bulk acoustic resonator with X-cut LiNbO3 layer transfer. Issued 2009-11-02. doi:10.1063/1.3258496
  10. Chrystel Deguet et al., ECS Transactions 33 225-232 (2010). LiNbO3 Single Crystal Layer Transfer Techniques for High Performances RF Filters. Issued 2010-10-01. doi:10.1149/1.3483511
  11. Andrea Guarino et al., Nature Photonics 1 407-410 (2007). Electro–optically tunable microring resonators in lithium niobate. Issued 2007-07. doi:10.1038/nphoton.2007.93
  12. H. Hu et al., Optics Express 17 24261 (2009). Lithium niobate photonic wires. Issued 2009-12-21. doi:10.1364/oe.17.024261
  13. Cheng Wang et al., Optics Express 22 30924 (2014). Integrated high quality factor lithium niobate microdisk resonators. Issued 2014-12-15. doi:10.1364/oe.22.030924
  14. Holger Hartung et al., Optics Letters 33 2320 (2008). Fabrication of ridge waveguides in zinc-substituted lithium niobate by means of ion-beam enhanced etching. Issued 2008-10-15. doi:10.1364/ol.33.002320
  15. Zhang et al., Optica 4 1536 (2017). Monolithic ultra-high-Q lithium niobate microring resonator. Issued 2017-12-18. doi:10.1364/optica.4.001536

Events of 7.8

9 events; status per event
DateEventWhoRefSt
1995-07-06Smart Cut: hydrogen implantation plus bonding for silicon-on-insulatorM. BruelDOIrec
1998-10-19Single-crystal LiNbO3 films by crystal ion slicingM. Levy, R. M. Osgood Jr. +5DOIrec
2004-11-15Submicrometer LiNbO3 films by ion slicing and wafer bonding on SiO2, r33 = 31 pm/VPayam Rabiei, Peter GunterDOIrec
2007-07Electro-optically tunable microring resonators in lithium niobate (bonded film)A. Guarino, G. Poberaj +3DOIrec
2008-10-15Ridge waveguides in Zn-substituted LiNbO3 by ion-beam enhanced etchingHolger Hartung, Ernst-Bernhard Kley +3DOIrec
2009-12-21Lithium niobate photonic wires from a bonded single-crystal filmH. Hu, R. Ricken +1DOIrec
2010NANOLN (Jinan Jingzheng Electronics) established; supplies LNOI and LTOI wafersURLrec
2012-07-16'Lithium niobate on insulator (LNOI) for micro-photonic devices' (review)G. Poberaj, H. Hu +2DOIrec
2014-12-15Integrated high-Q LiNbO3 microdisk resonatorsCheng Wang, Michael J. Burek +2DOIrec