6.1 Electro-optic modulators
L1 Phenomenon
A modulator is an interferometer whose arms are built in a Pockels crystal. A voltage across one or both arms changes the refractive index, shifts the phase of the light in that arm, and moves the output between bright and dark. Thin-film LN confines light to a sub-micron ridge, so the gold electrodes can sit a few microns apart (median gap 5.0 µm over 144 TFLN device rows derived); the same index change then needs a few volts, and the electrodes can carry a microwave signal along the chip at nearly the speed of the light.
Die: Li 2026 (device d) geometry from eo-modulator-atlas (9 mm G-S-G line, x-cut) reported; output arm brightness follows T at the bias point; light at 1550 nm in false color. Drag to orbit.
- Arm phase difference Δφ (bias ± swing)
- −90.0° ± 45.0°
- Eye height (of T = 0..1)
- 0.66
- Static extinction
- 7.7 dB
- Vpp / Vπ
- 0.50
- Symbol rate / f3dB
- 1.00
L2 Transfer function, VπL, families
Transfer function and half-wave voltage
Mach-Zehnder intensity transfer (lossless, balanced splitters):
- Vπ is the voltage that moves T from maximum to minimum; φb is the static bias phase.
- Push-pull drive puts opposite fields in the two arms; one signal electrode between two grounds (G-S-G) does this on x-cut film. For the same electrode, the push-pull MZM Vπ is half the single-arm phase-shifter Vπ.
- IQ modulator: two MZMs nested in an outer interferometer with a 90-degree phase between them; each child MZM is biased at null.
Half-wave voltage-length product for an x-cut film, TE mode, field along the crystal z axis:
- g: electrode gap; Γ: overlap between the normalized optical intensity and the applied field Ez (Γ = (g/V) integral of Ez |Eopt|2 dA / integral of |Eopt|2 dA). The full tensor overlap is evaluated by the eo-modulator-atlas FEM engine (chapter 2.2, L3).
- Worked value: λ = 1.55 µm, g = 5 µm template, Γ = 0.5 template, ne = 2.1376 at 1550 nm, 21 C derived, r33S = 30.8 pm/V at 633 nm P-comp (Turner 1966 via Weis and Gaylord Table 4): VπL = 2.58 V cm derived.
- r33 choice moves the result: the Kaminow 1980 value 28.8 pm/V P-comp gives 2.75 V cm derived (+7%). No primary r33 measurement at 1550 nm is available; the 633 nm clamped value is used.
- Atlas cross-check: median telecom push-pull VπL for TFLN MZM/IQ device rows is 2.44 V cm (n = 66 rows) derived: eo-modulator-atlas device rows at commit eb97f96, telecom band, push-pull convention, MZM and IQ.
- ne at λ (Zelmon 1997)
- 2.1376
- r33 (633 nm, clamped)
- 30.8 pm/V
- Reduction vs 1.55 µm
- × 1.00
Implied overlap from the atlas (derived): over 71 x-cut TFLN push-pull MZM/IQ device rows with gap, wavelength, and VπL, Γimplied spans 0.15 to 6.12, with 45 of 71 rows between 0.45 and 0.67 derived. Values above 1 are not physical overlaps; 8 rows exceed 1 and mark devices outside the lateral-gap model or its inputs: four operating points of the Shen 2024 slow-light MZM (6.12, 3.21, 1.84, 1.31), two Yu 2024 devices that claim a material enhancement (1.33, 1.47), and two Xue 2026 devices (1.03, capacitively loaded, thick silica buffer). The formula assumes the 633 nm clamped r33 at all wavelengths and Zelmon ne at the row wavelength.
Modulator families
| Family | How it works | Atlas TFLN device rows (by electrode type or device class) | Representative device, values |
|---|---|---|---|
| Lumped electrode | Electrode shorter than the RF wavelength; RC-limited | lumped 26 | Wang 2018 (Opt. Express) rings; see the ring table below |
| Traveling-wave CPW / GSG | Electrode is a transmission line co-propagating with the light | GSG 72, CPW 20, GSSG 8 | CMOS-compatible drive, up to 210 Gb/s, on-chip loss < 0.5 dB reported |
| Capacitively loaded (T-rail) traveling wave | Small T-shaped segments reach toward the waveguide; current flows in rails away from the gap | capacitively loaded 32 | RF Vπ 1.3 V with 1.8 dB roll-off at 50 GHz reported |
| Slow-wave electrode | Periodic loading raises the RF index to match a high optical group index | slow wave 15 | 0.21 V cm, 1 mm, slow-light SiN-loaded TFLN, bandwidth > 110 GHz reported |
| Ridge-top transparent electrodes | Conductive oxide on the ridge, field across the film | not counted (no atlas class) | 0.33 V cm, 300 µm; 2.4 dB roll-off at 110 GHz; 3 dB bandwidth 145 GHz extrapolated; on-chip IL 2.7 dB reported |
| IQ modulator | Nested MZMs | IQ 10 | dual-polarization IQ, sub-1-V drive, 110 GHz, 1.96 Tb/s net single wavelength reported |
| Ring / photonic-crystal resonator | Resonance shifted by Pockels effect; photon lifetime limits speed | ring 15, other resonator 16 | see below |
| Heterogeneous Si or SiN + bonded LN | Light in Si/SiN, mode partly in LN; LN unetched | bonded heterogeneous 26 (all TFLN rows) | 110 GHz, 110 mW optical power, hybrid Si-LN reported; Si/LN MZM for 100 Gbit/s reported |
Counts: 209 TFLN device rows at atlas commit eb97f96 derived; 31 rows have no electrode type.
Ring and photonic-crystal modulators
Resonance shift per volt: Δ λ = λ Δ neff / ng. A resonator stores light for the photon lifetime τ = QL / ω0, so its modulation response rolls off on the scale of the linewidth Δ ν = ν0 / QL; the exact factor depends on detuning.
| Device | QL | 3 dB bandwidth | Note | Source |
|---|---|---|---|---|
| TFLN ring, Q 5,700 | 5,700 | 40 GHz | reported | |
| TFLN ring, Q 8,000 | 8,000 | 30 GHz | Q approximate in source | reported |
| TFLN ring, Q 18,000 | 18,000 | 11 GHz | reported | |
| PhC cavity | 14,000 (approx.) | 17.5 GHz (approx.) | photonic-crystal modulator | reported |
| Topological PhC, 64 µm electrode | 2,200 | > 110 GHz | 220 GBd NRZ eye | reported |
The Lorentzian linewidth ν0/QL at 1550 nm is 34 GHz for QL = 5,700 and 10.7 GHz for QL = 18,000 derived; measured bandwidths can exceed it when the device is operated detuned (atlas note on Zhang 2023 (b): headline 104 GHz at the -8 dB detuning point, authors' photon-lifetime limit 35 GHz).
- Linewidth (speed scale)
- 19.34 GHz
- Photon lifetime
- 8.23 ps
- Resonance shift
- 0.0 pm
- T at the laser
- 0.500
L3 How Vπ and bandwidth are measured
How Vπ and bandwidth are measured, and why papers disagree
- Convention. Vπ can be quoted per phase-shifter arm, for a push-pull MZM, or as a differential (V+ minus V-) value; these differ by factors of 2. Values are kept in the convention each paper states; none are converted. Example: the authors of Aimone 2026 (a) quote 1.1 V cm (differential reference); 3.26 V × 7.5 mm gives 2.45 V cm derived.
- Frequency. Vπ measured below 1 GHz (DC, kHz or MHz triangle) and at RF differ: below about 20 kHz, charge relaxation in TFLN enhances the low-frequency response (relaxation-enhanced band 1-20 kHz, response measured 1 mHz to 1 MHz) reported. Vπ values are split at 1 GHz into DC and RF values.
- Bandwidth reference. "3 dB EO bandwidth" is 20 log10 of the detected modulation amplitude relative to a stated reference (DC, 1 GHz, or an unstated low-frequency plateau). Methods differ: VNA/LCA EO S21, optical sideband ratio, link EOE response.
- Instrument limits. 67 of 145 TFLN/TFLT bandwidth values in the atlas are lower bounds ("over 67 GHz", "over 110 GHz"); the most frequent bound values are 110 GHz (15 rows), 67 GHz (13), 50 GHz (12) derived. Medians over bounded data understate true bandwidth.
- Extrapolation. Several headline bandwidths are extrapolated beyond the measured range (e.g. 220 / 218 GHz for C / O band at 7 mm, extrapolated reported). Extrapolated bandwidths are a separate class from measured ones.
- Disclosure. Of 209 TFLN device rows, VπL is stated or derivable in 64%, 3 dB bandwidth in 60%, on-chip insertion loss in 25%, RF loss in 11%, Z0 in 10%, nRF in 10% derived.
Sources
| Ref | Title | Link |
|---|---|---|
| Chen et al. 2025 | Ultra‐Compact and Ultra‐High Speed Topological Photonic Crystal Modulator Based on Thin Film Lithium Niobate | doi:10.1002/lpor.202500380 |
| He et al. 2019 | High-performance hybrid silicon and lithium niobate Mach–Zehnder modulators for 100 Gbit s−1 and beyond | doi:10.1038/s41566-019-0378-6 |
| Holzgrafe et al. 2024 | Relaxation of the electro-optic response in thin-film lithium niobate modulators | doi:10.1364/OE.507536 |
| Kharel et al. 2021 | Breaking voltage–bandwidth limits in integrated lithium niobate modulators using micro-structured electrodes | doi:10.1364/OPTICA.416155 |
| Li et al. 2020 | Lithium niobate photonic-crystal electro-optic modulator | doi:10.1038/s41467-020-17950-7 |
| Liu et al. 2025 | Ultrahigh‐Efficiency Dual‐Band Thin‐Film Lithium Niobate Modulator Incorporating Low‐k Underfill for 390 Gbit s −1 PAM8 Transmission | doi:10.1002/lpor.202402053 |
| Shen et al. 2024 | Highly Efficient Slow‐Light Mach–Zehnder Modulator Achieving 0.21 V cm Efficiency with Bandwidth Surpassing 110 GHz | doi:10.1002/lpor.202401092 |
| Valdez et al. 2022 | 110 GHz, 110 mW hybrid silicon-lithium niobate Mach-Zehnder modulator | doi:10.1038/s41598-022-23403-6 |
| Wang et al. 2018 | Integrated lithium niobate electro-optic modulators operating at CMOS-compatible voltages | doi:10.1038/s41586-018-0551-y |
| Wang et al. 2018 | Nanophotonic lithium niobate electro-optic modulators | doi:10.1364/oe.26.001547 |
| Weis and Gaylord 1985 | Lithium niobate: Summary of physical properties and crystal structure | doi:10.1007/BF00614817 |
| Xu et al. 2022 | Dual-polarization thin-film lithium niobate in-phase quadrature modulators for terabit-per-second transmission | doi:10.1364/OPTICA.449691 |
| Yu et al. 2025 | 0.33 V · cm thin-film lithium niobate Mach-Zehnder modulator with ridge-top transparent electrode | doi:10.1364/oe.572384 |
| Zelmon et al. 1997 | Infrared corrected Sellmeier coefficients for congruently grown lithium niobate and 5 mol% magnesium oxide –doped lithium niobate | doi:10.1364/JOSAB.14.003319 |